About This Item
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Quality Level
assay
98%
form
powder
density
9.68 g/mL at 25 °C (lit.)
SMILES string
O=[Hf]=O
InChI
1S/Hf.2O
InChI key
CJNBYAVZURUTKZ-UHFFFAOYSA-N
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Application
- Hafnium(IV) oxide: Utilized predominantly in the semiconductor industry, Hafnium(IV) oxide offers excellent thermal and chemical stability, which makes it suitable as a high-k gate dielectric material in metal-oxide-semiconductor (MOS) devices. Its application has become increasingly important with the miniaturization of electronic components, aiding in the enhancement of transistor performance without further reducing the component size. This role is critical in the development of more efficient, faster computing technologies (Sigma-Aldrich, CAS 12055-23-1).
wgk_germany
nwg
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Gloves, type N95 (US)
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