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38385

Sigma-Aldrich

Dichlorodiisopropylsilane

≥97.0% (GC)

Synonym(s):

Diisopropyldichlorosilane

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About This Item

Empirical Formula (Hill Notation):
C6H14Cl2Si
CAS Number:
7751-38-4
Molecular Weight:
185.17
Beilstein/REAXYS Number:
1736244
MDL number:
MFCD00054895
UNSPSC Code:
12352001
PubChem Substance ID:
329755681
NACRES:
NA.22

Quality Level

100

assay

≥97.0% (GC)

form

liquid

refractive index

n20/D 1.444

bp

66 °C/27 mmHg (lit.)

density

1.026 g/mL at 20 °C (lit.)

SMILES string

CC(C)[Si](Cl)(Cl)C(C)C

InChI

1S/C6H14Cl2Si/c1-5(2)9(7,8)6(3)4/h5-6H,1-4H3

InChI key

GSENNYNYEKCQGA-UHFFFAOYSA-N

Related Categories

Other Notes

Protecting group reagent; brings two alcohols in close contact for "tethering technique"

pictograms

FlameCorrosion
GHS02,GHS05

signalword

Danger

hcodes

H226,H314

Hazard Classifications

Flam. Liq. 3 - Skin Corr. 1B

wgk_germany

WGK 3

flash_point_f

109.4 °F

flash_point_c

43 °C

ppe

Faceshields, Gloves, Goggles, type ABEK (EN14387) respirator filter

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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J.H. Hutchinson et al.
Tetrahedron Letters, 32, 573-573 (1991)
C.L. Bradford et al.
Tetrahedron Letters, 36, 4189-4189 (1995)
David Gräfe et al.
Nature communications, 9(1), 2788-2788 (2018-07-19)
Existing photoresists for 3D laser lithography that can be removed after development in a subtractive manner typically suffer from harsh cleavage conditions. Here, we report chemoselectively cleavable photoresists for 3D laser lithography based on silane crosslinkers, allowing the targeted degradation

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