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407216

Sigma-Aldrich

Triarylsulfonium hexafluorophosphate salts, mixed

50% in propylene carbonate

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About This Item

CAS Number:
109037-77-6
MDL number:
MFCD03412152
UNSPSC Code:
12352300
PubChem Substance ID:
24865433
NACRES:
NA.23

form

liquid

concentration

50% in propylene carbonate

refractive index

n20/D 1.5 (lit.)

density

1.32 g/mL at 25 °C (lit.)

SMILES string

F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.F[P-](F)(F)(F)(F)F.S(c1ccccc1)c2ccc(cc2)[S+](c3ccccc3)c4ccccc4.S(c5ccc(cc5)[S+](c6ccccc6)c7ccccc7)c8ccc(cc8)[S+](c9ccccc9)c%10ccccc%10

InChI

1S/C36H28S3.C24H19S2.3F6P/c1-5-13-31(14-6-1)38(32-15-7-2-8-16-32)35-25-21-29(22-26-35)37-30-23-27-36(28-24-30)39(33-17-9-3-10-18-33)34-19-11-4-12-20-34;1-4-10-20(11-5-1)25-21-16-18-24(19-17-21)26(22-12-6-2-7-13-22)23-14-8-3-9-15-23;3*1-7(2,3,4,5)6/h1-28H;1-19H;;;/q+2;+1;3*-1

InChI key

BXEZIWXFNSCYKD-UHFFFAOYSA-N

Related Categories

General description

Mixed triarylsulfonium hexafluorophosphate salts are cationic photoinitiators which are used as ultraviolet curing agents that have bifunctional cross-linking monomers.

Application

It can be mixed with propylene glycol monomethyl ether acetate (PGMA) that may be blended with bisphenol F resin which can be used in the fabrication of UV curable nano-imprinted epoxy resist. It can also be used as a photo-initiator for photo-polymerization of epoxy/acrylate composites which find applications in UV protective coating on electronic devices.

pictograms

Exclamation mark
GHS07

signalword

Warning

hcodes

H319

Hazard Classifications

Eye Irrit. 2

Storage Class

10 - Combustible liquids

wgk_germany

WGK 3

flash_point_f

235.4 °F - closed cup

flash_point_c

113 °C - closed cup

ppe

Eyeshields, Gloves, type ABEK (EN14387) respirator filter

Certificates of Analysis (COA)

Search for Certificates of Analysis (COA) by entering the products Lot/Batch Number. Lot and Batch Numbers can be found on a product’s label following the words ‘Lot’ or ‘Batch’.

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Novel visible photoinitiators systems for free-radical/cationic hybrid photopolymerization.
Podsiadly R.
Dyes and Pigments, 91(3), 422-426 (2011)
Nanoimprinting ultrasmall and high-aspect-ratio structures by using rubber-toughened UV cured epoxy resist.
Shin YJ, et al.
Nanotechnology, 24(25), 255302-255302 (2013)
Kinetics study of the UV-initiated cationic polymerization of cycloaliphatic diepoxide resins.
Voytekunas VY, et al.
European Polymer Journal, 44(11), 3640-3649 (2008)

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