774022
Yttrium(III) oxide
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.99% trace metals basis
Synonym(s):
Yttria
About This Item
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assay
99.99% trace metals basis
form
powder
reaction suitability
core: yttrium
diam. × thickness
2.00 in. × 0.25 in.
mp
2410 °C (lit.)
density
5.01 g/mL at 25 °C (lit.)
SMILES string
O=[Y]O[Y]=O
InChI
1S/3O.2Y
InChI key
SIWVEOZUMHYXCS-UHFFFAOYSA-N
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Application
Yttrium oxide sputtering target can be used for physical vapor deposition of thin films of yttria stabilized zirconia layers for IT-SOFC. Yttrium containing films are used as thermal barrier and protective coatings in thermoelectric devices, rare earth doped yttrium oxide films are studied for phosphor applications.
Storage Class
13 - Non Combustible Solids
wgk_germany
WGK 1
flash_point_f
Not applicable
flash_point_c
Not applicable
Certificates of Analysis (COA)
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